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Electrodeposition of Metallic Borides.
McCawley-FX; Wyche-C; Schlain-D
U S Pat 3 827 954 1974 Aug; :
An adherent and coherent deposit on a conditioned substrate is formed from a molten alkali metal borate electrolyte containing 0.1- 3 pct of a compound, calculated as ti, of the group comprising ti oxide and alkali metal salts of ti oxygen acids. After stabilizing the molten bath, using either a ti or a pressed tib2 anode, electrodeposition is carried out with a tib2 anode, at a preferred temperature of 875-925 deg. C and a current density of 0.05-15, Preferably 0.25-2.5 A/in2. In an example, an electrolyte is used containing nabo2 39.08, Libo2 58.62, Na2tio3 0.98, Li2tio3 0.76, And tio2 0.56 pct, with a pressed tib2 anode and a rotating mo cathode at 900 deg. C and a C.D. of 0.65 A/in2. After 2 h of preliminary stabilization, the loose cathode deposit was washed off, then after an additional 2 h of electrolysis a bright, smooth adherent coating of oriented tib2 was formed which was 3.5 Mils thick and had no loose material. Using pressed tib2, rather than ti, as the anode increased the plating rates, enhanced bath stability, and decreased bath conditioning time.
U.S. Pat. 3,827,954; Aug. 6, 1974; Chem. Abstr. 82:23,731W
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