NIOSHTIC-2 Publications Search

Development of a Rapid, Position-sensitive X-ray Diffraction Device for Silica Analysis.

Authors
Fitzpatrick-J; Wardzala-E
Source
For Reference Only At Bureau Libraries :79 pages
Link
NIOSHTIC No.
10004427
Abstract
The objective of this study was to design and fabricate a device with few or no moving parts that could acquire desired x-ray data in a short period of sampling time. A rapid, position-sensitive x-ray diffraction device (based on a parafocusing x-ray geometry and utilizing and x-ray sensitive, phosphor-coated, linear diode array) was developed. The smallest loading of quartz powder consistently detectable with the device was found to be 28.8 Ug/cm2. Loadings as small as 5.8 Ug/cm2 were detected, although not consistently. The device was found to be limited mainly by sample distribution on the substrate filter rather than the total sample weight.
Publication Date
19840101
Document Type
CP; Final Contract Report;
Fiscal Year
1984
Identifying No.
OFR 22-85
NIOSH Division
PRC;
Source Name
For Reference Only At Bureau Libraries
Performing Organization
Univ. of Denver
Page last reviewed: March 11, 2019
Content source: National Institute for Occupational Safety and Health Education and Information Division