NIOSHTIC-2 Publications Search

Glove permeation by propylene glycol monomethyl ether acetate - a photoresist solvent used in semiconductor device processing.

Zellers ET; Sulewski R

Appl Occup Environ Hyg 1992 Jun; 7(6):392-397

https://doi.org/10.1080/1047322X.1992.10390177

00208488

A study was made of the permeation of propylene-glycol-monomethyl- ether-acetate (84540578) (PGMEA) through various gloves commonly used in semiconductor fabrication facilities. Permeation tests were performed using a 5.1 centimeter diameter test cell in an open loop configuration with nitrogen as the collection medium. Gloves tested included North B-161 (butyl rubber), Edmont Nytek 49-155 (nitrile rubber), Pioneer Trionic (natural/nitrile/neoprene blend), Playtex 827 (natural/neoprene blend), and Edmont Puretek 30-139 (natural rubber). The butyl rubber gloves provided the highest level of resistance of PGMEA with no breakthrough being observed over the 4 hour test period. Nitrile rubber gloves provided excellent permeation resistance as well with a break through time of 147 minutes. Gloves composed of natural rubber and blends of natural rubber with other polymers provided much shorter breakthrough times. Of all the gloves tested the North Model B-161 butyl rubber glove provided the best protection against PGMEA.

NIOSH-Publication; NIOSH-Grant; Control-technology; Electronics-industry; Personal-protective-equipment; Hand-protection; Skin-exposure; Materials-testing; Semiconductors; Organic-solvents

Environmental & Indust Health University of Michigan 109 S Observatory Ann Arbor, MI 48109-2029

AOEHE9

84540-57-8

19920601

Journal Article

23834.00

Grant

1992

Grant-Number-R03-OH-02667

6

1047-322X

Control-technology

Applied Occupational and Environmental Hygiene

MI

University of Michigan at Ann Arbor, Ann Arbor, Michigan