NIOSHTIC-2 Publications Search

Industrial hygiene walk-through survey report of National Semiconductor, Santa Clara, California.

Authors
Pasquini D
Source
Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, IWS 113-16, 1981 Jul; :1-17
Link
NIOSHTIC No.
00197325
Abstract
A walk through survey was conducted at the National Semiconductor facility (SIC-3671, 3672, 3673, 3674, 3675, 3676) located in Santa Clara, California for the purpose of identifying and estimating worker exposure to potentially hazardous agents in the electronic component manufacturing industry. The survey team reviewed the facility's health and safety program and the fabrication operations for the metal oxide semiconductor (MOS). At the time of the survey no serious deficiency was noted in the safety and health program. However, the authors recommend that the respiratory protection program be upgraded. Two ventilation problems were identified. The first dealt with the particle shields on combination laminar flow/exhaust hoods and the second with the capacity of the exhaust systems.
Keywords
NIOSH-Author; NIOSH-Survey; Field-Study; Region-9; Electronics-industry; Semiconductors; Electrical-workers
Publication Date
19810701
Document Type
Field Studies; Industry Wide
Fiscal Year
1981
NTIS Accession No.
PB91-173542
NTIS Price
A03
Identifying No.
IWS-113-16
NIOSH Division
DSHEFS
SIC Code
3671
Source Name
National Institute for Occupational Safety and Health
State
CA; OH
Page last reviewed: June 18, 2020
Content source: National Institute for Occupational Safety and Health Education and Information Division