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Industrial hygiene walk-through survey report of National Semiconductor, Santa Clara, California.
Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, IWS 113-16, 1981 Jul; :1-17
A walk through survey was conducted at the National Semiconductor facility (SIC-3671, 3672, 3673, 3674, 3675, 3676) located in Santa Clara, California for the purpose of identifying and estimating worker exposure to potentially hazardous agents in the electronic component manufacturing industry. The survey team reviewed the facility's health and safety program and the fabrication operations for the metal oxide semiconductor (MOS). At the time of the survey no serious deficiency was noted in the safety and health program. However, the authors recommend that the respiratory protection program be upgraded. Two ventilation problems were identified. The first dealt with the particle shields on combination laminar flow/exhaust hoods and the second with the capacity of the exhaust systems.
NIOSH-Author; NIOSH-Survey; Field-Study; Region-9; Electronics-industry; Semiconductors; Electrical-workers
Field Studies; Industry Wide
NTIS Accession No.
National Institute for Occupational Safety and Health
Page last reviewed: September 2, 2020
Content source: National Institute for Occupational Safety and Health Education and Information Division