Safety and environmental control systems used in chemical vapor deposition (CVD) reactors at AT and T-Microelectronics, Reading, Pennsylvania.
Rhoades-BJ; Sands-DG; Mattera-VD Jr.
Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan 1989:203-212
The chemical vapor deposition (CVD) process being used in the production of photonic materials made from alloys of indium (7440746), gallium (7440553), arsenic (7440382), and phosphorus (7723140) at the AT-and-T Microelectronics Facility in Reading, Pennsylvania was described. The CVD system is made up of five sections: the bubbler loading zone, the substrate loading zone, the gas inject area, the vent treatment area, and the furnace area, each located in separate partitions. Precautions to employ when in the area of the bubbler loader were noted. The CVD reactor uses arsenic- trichloride (7784341) and phosphorus-trichloride (7719122) supplied in 100 gram glass ampoules. Inhalation exposure may damage the mucous membranes of the respiratory tract and cause nervous and circulatory system disorders. Exposure internally damages abdominal organs and causes skin and vascular changes. Skin contact can result in burns. Spills of arsenic-trichloride are treated with water which reacts to form the less corrosive arsenious-oxide. The floor drain valves are automatically opened when the water nozzle is turned on. Steps used in the control of the reactor are delineated including the safety logic used to maintain safe operating conditions in the reactor even if the microprocessor fails or is programmed incorrectly. Air scrubbing systems for the CVD reactors remove particulates and toxic gases.
Semiconductors; Electronics-industry; Accident-prevention; Toxic-gases; Arsenic-compounds; Phosphorus-compounds; Control-technology; Safety-practices;
7440-74-6; 7440-55-3; 7440-38-2; 7723-14-0; 7784-34-1; 7719-12-2;
Control Technology and Personal Protective Equipment; Research Tools and Approaches; Control-technology;
Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan