NIOSHTIC-2 Publications Search

Advanced Search   Search Help   About NIOSHTIC-2    Feedback

Preliminary control technology survey report, Rockwell International Corporation, Electronic Devices Division, Newport Beach, California.

Authors
Mihlan GJ; Willson RD
Source
Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-28a, 1984 Jul; :1-31
Link
https://www.cdc.gov/niosh/surveyreports/pdfs/115-28a.pdf
NIOSHTIC No.
00135196
Abstract
A control technology survey was conducted at the electronics devices division of Rockwell International Corporation (SIC-3674), Newport Beach, California, in January, 1982. Engineering controls included isolation, shielding, and local exhaust ventilation. Isolation was used in plasma etching, ion implantation, low pressure chemical vapor deposition, metalization, and wet chemical etching and stripping operations. Shielding was used in ion implantation to limit X-ray emissions, in plasma etching and radiofrequency sputtering to control emissions, and in substrate exposure to control ultraviolet emissions. Local exhaust ventilation was used in wet chemical cleaning and etching, diffusion, thermal oxidation operations, and in the gas storage cabinets. Most operations were automated. Continuous area monitoring for phosphine (7803512) was conducted. Personal protective equipment used included smocks, safety glasses, head covers, and protective shoes. Operators at wet chemical stations were required to wear acid resistant aprons, gloves, and face shields. The facility employed consultants in industrial hygiene. The authors note that the facility does not have a combustible gas monitoring system. Recommendations include installing a combustible gas monitoring system and substitution of silicon-tetrafluoride (7783611) in the plasma etching process with a less toxic substance.
Keywords
NIOSH-Author; NIOSH-Survey; Control-technology; Field-Study; Electronics-industry; Combustible-gases; Industrial-engineering; Industrial-chemicals; Silicon-compounds; Fluoride-compounds; Radio-waves; Ultraviolet-light; Region-9
CAS No.
7803-51-2; 7783-61-1
Publication Date
19840706
Document Type
Field Studies; Control Technology
Fiscal Year
1984
NTIS Accession No.
PB85-107118
NTIS Price
A04
Identifying No.
ECTB-115-28a
NIOSH Division
DPSE
SIC Code
3674
Source Name
National Institute for Occupational Safety and Health
State
CA; OH
Page last reviewed: September 2, 2020
Content source: National Institute for Occupational Safety and Health Education and Information Division