Preliminary Control Technology Survey Report No. CT-115-29a, Western Digital Corporation, Newport Beach, California.
A preliminary control technology survey was conducted at Western Digital Corporation (SIC-3674), Newport Beach, California, on January 19, 1982. Engineering controls included isolation, shielding, and local exhaust ventilation. Isolation was used in the plasma etching, ion implantation, low pressure chemical vapor deposition, and metalization processes. Shielding was used in plasma etching to limit radiofrequency radiation emissions, in ion implantation to control X-ray emissions, and in substrate exposure to control ultraviolet emissions. Local exhaust ventilation was used in photolithography processes, wet chemical cleaning and etching processes, diffusion, thermal oxidation, chemical vapor deposition, wafer back side abrasion, and in storage cabinets containing compressed gas cylinders. Most operations were automated and controlled by microprocessor. Continuous area monitoring was conducted for phosphine (7803512). Required personal protective equipment included acid resistant gloves with iron gauntlets, face shields, or safety glasses. The authors note that the facility did not have a combustible gas monitoring system. Recommendations include installation of a combustible gas monitoring system, storage of hydrogen and oxygen cylinders in separate areas, and enclosure and ventilation of furnaces.
Division of Physical Sciences and Engineering, NIOSH, U.S. Department of Health and Human Services, Cincinnati, Ohio, Report No. CT-115-29a, 31 pages, 8 references