Preliminary control technology survey report, Micro Power Systems, Inc., Santa Clara, California.
Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, CT 115-26a, 1984 Jul; :1-31
A survey to assess control technology was conducted at Micro Power Systems, Incorporated (SIC-3674), Santa Clara, California, in January, 1982. Engineering controls included isolation, shielding, and local exhaust ventilation. Isolation was used in plasma etching, ion implantation, chemical vapor deposition, epitaxial silicon deposition, and metalization processes. Shielding was used in the ion implantation units to limit X-ray emissions, in plasma etching and epitaxial silicon deposition to control radiofrequency radiation emissions, and in substrate exposure to limit ultraviolet emissions. Local exhaust ventilation was used in wet chemical cleaning and etching, in photolithography processes, and in the diffusion furnaces. The electron beam evaporation, direct current sputtering, plasma etching, ion implantation, and chemical vapor and epitaxial silicon deposition processes were automated. Personal protective equipment used included safety glasses, face shields, acid resistant coveralls, and gloves. The facility had a health and safety program that included worker training in safety, materials handling, personal protective equipment, and hazard reporting. The facility retained consultants in industrial hygiene, safety, and health care. Recommendations include establishing a program of preplacement and periodic medical examinations and evaluation of the ability of the ventilation system to control chromic-acid (7738945), phenol (108952), and antimony-trioxide (1309644).