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Industrial hygiene walk-through survey report of Dow Corning Corporation Semiconductor Plant, Hemlock, Michigan.
Cincinnati, OH: U.S. Department of Health, Education, and Welfare, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, IWS 68-22, 1978 Oct; :1-19
Worker exposures to potentially hazardous physical and chemical agents were determined at the Dow Corning Corporation's semiconductor facility (SIC-3674) in Hemlock, Michigan, on September 6, 1978. The survey was part of a NIOSH health study of newly developing energy technologies. The company had access to an industrial hygiene staff. Signs of leakage of trichlorosilane (10025782) (TCS) were noted at the truck unloading area. Heavy accumulation of a white powder on the ceilings indicated the presence of airborne process materials. The author concludes that the operations at the facility may not be extensive enough to be representative of the photovoltaic cell industry. He recommends an industrial hygiene survey for the TCS unloading area, main production vessel rooms, the cleaning room, and for material recovery processes.
NIOSH-Author; NIOSH-Survey; Field-Study; Region-5; Health-surveys; Worker-health; Industrial-hygiene; Workplace-studies; Occupational-health-programs; Industrial-processes; Air-contamination
Field Studies; Industry Wide
NTIS Accession No.
National Institute for Occupational Safety and Health
PEDCo Environmental, Inc., Cincinnati, Ohio
Page last reviewed: September 2, 2020
Content source: National Institute for Occupational Safety and Health Education and Information Division