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Electrodeposition of Copper.

Authors
Schlain-D; McCawley-FX; Smith-GR
Source
U S Pat 4 053 377 1977 Oct; :
Link
NIOSHTIC No.
10011902
Abstract
An electrorefining or electrowinning method using high current densities and electrolyte flow rates is described. The current densities are approximately 60-400 a/ft2 and the flow rates are 75 ft/min, preferably 150-400 ft/min. This method was used for the refining of blister copper in a bath containing cuso4 and h2so4. The operating temperature was approximately 55 deg c; the c.D. 60- 300 A/ft2; the flowrate 285-400 ft/min; the deposit thickness 194- 502 mils; and the deposition time 16-188 h. The deposits were smooth, of high purity, and thick even at the high current densities used.
Publication Date
19771001
Document Type
PA;
Fiscal Year
1978
NTIS Accession No.
NTIS Price
Identifying No.
PAT 4,053,377
NIOSH Division
CPRC;
Source Name
U.S. Pat. 4,053,377; Oct. 11, 1977; Chem. Abstr. 85:150,989Y
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