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Glove permeation by propylene glycol monomethyl ether acetate - a photoresist solvent used in semiconductor device processing.

Authors
Zellers-ET; Sulewski-R
Source
Appl Occup Environ Hyg 1992 Jun; 7(6):392-397
NIOSHTIC No.
00208488
Abstract
A study was made of the permeation of propylene-glycol-monomethyl- ether-acetate (84540578) (PGMEA) through various gloves commonly used in semiconductor fabrication facilities. Permeation tests were performed using a 5.1 centimeter diameter test cell in an open loop configuration with nitrogen as the collection medium. Gloves tested included North B-161 (butyl rubber), Edmont Nytek 49-155 (nitrile rubber), Pioneer Trionic (natural/nitrile/neoprene blend), Playtex 827 (natural/neoprene blend), and Edmont Puretek 30-139 (natural rubber). The butyl rubber gloves provided the highest level of resistance of PGMEA with no breakthrough being observed over the 4 hour test period. Nitrile rubber gloves provided excellent permeation resistance as well with a break through time of 147 minutes. Gloves composed of natural rubber and blends of natural rubber with other polymers provided much shorter breakthrough times. Of all the gloves tested the North Model B-161 butyl rubber glove provided the best protection against PGMEA.
Keywords
NIOSH-Publication; NIOSH-Grant; Control-technology; Electronics-industry; Personal-protective-equipment; Hand-protection; Skin-exposure; Materials-testing; Semiconductors; Organic-solvents
Contact
Environmental & Indust Health University of Michigan 109 S Observatory Ann Arbor, MI 48109-2029
CODEN
AOEHE9
CAS No.
84540-57-8
Publication Date
19920601
Document Type
Journal Article
Funding Amount
23834.00
Funding Type
Grant
Fiscal Year
1992
NTIS Accession No.
NTIS Price
Identifying No.
Grant-Number-R03-OH-02667
Issue of Publication
6
ISSN
1047-322X
Priority Area
Control-technology
Source Name
Applied Occupational and Environmental Hygiene
State
MI
Performing Organization
University of Michigan at Ann Arbor, Ann Arbor, Michigan
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