Skip directly to search Skip directly to A to Z list Skip directly to page options Skip directly to site content

NIOSHTIC-2 Publications Search

Search Results

A measure of goodness-of-fit for the lognormal model applied to occupational exposures.

Authors
Waters-MA; Selvin-S; Rappaport-SM
Source
Am Ind Hyg Assoc J 1991 Nov; 52(11):493-502
NIOSHTIC No.
00205004
Abstract
A new method was presented to help in the evaluation of the goodness of fit to the log normal model that is a simple extension of calculations made routinely by occupational hygienists. This new measure, the ratio metric compares the ratio of two estimators of the mean, the direct estimate of the mean and the maximum likelihood estimate of the mean of a lognormal distribution. The ratio metric gave results which were compared to probability plotting and to two traditional measures of goodness of fit, the Lilliefors test and the W-test. The results of the ratio and W-tests were comparable for a variety of occupational exposure data, but the Lilliefors test was overly conservative and did not detect several cases of gross deviations from lognormality. Results indicated that the ratio metric is an effective alternative to the Lilliefors test and is easier to perform than the W-test for the range of data usually encountered by occupational hygienists.
Keywords
NIOSH-Author; Statistical-analysis; Occupational-exposure; Epidemiology; Exposure-levels; Industrial-hygiene; Industrial-exposures
CODEN
AIHAAP
Publication Date
19911101
Document Type
Journal Article
Fiscal Year
1992
NTIS Accession No.
NTIS Price
Issue of Publication
11
ISSN
0002-8894
Source Name
American Industrial Hygiene Association Journal
TOP