Skip directly to search Skip directly to A to Z list Skip directly to page options Skip directly to site content

NIOSHTIC-2 Publications Search

Search Results

Safety and environmental control systems used in chemical vapor deposition (CVD) reactors at AT and T-Microelectronics, Reading, Pennsylvania.

Authors
Rhoades-BJ; Sands-DG; Mattera-VD Jr.
Source
Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan 1989:203-212
Link
NIOSHTIC No.
00189066
Abstract
The chemical vapor deposition (CVD) process being used in the production of photonic materials made from alloys of indium (7440746), gallium (7440553), arsenic (7440382), and phosphorus (7723140) at the AT-and-T Microelectronics Facility in Reading, Pennsylvania was described. The CVD system is made up of five sections: the bubbler loading zone, the substrate loading zone, the gas inject area, the vent treatment area, and the furnace area, each located in separate partitions. Precautions to employ when in the area of the bubbler loader were noted. The CVD reactor uses arsenic- trichloride (7784341) and phosphorus-trichloride (7719122) supplied in 100 gram glass ampoules. Inhalation exposure may damage the mucous membranes of the respiratory tract and cause nervous and circulatory system disorders. Exposure internally damages abdominal organs and causes skin and vascular changes. Skin contact can result in burns. Spills of arsenic-trichloride are treated with water which reacts to form the less corrosive arsenious-oxide. The floor drain valves are automatically opened when the water nozzle is turned on. Steps used in the control of the reactor are delineated including the safety logic used to maintain safe operating conditions in the reactor even if the microprocessor fails or is programmed incorrectly. Air scrubbing systems for the CVD reactors remove particulates and toxic gases.
Keywords
Semiconductors; Electronics-industry; Accident-prevention; Toxic-gases; Arsenic-compounds; Phosphorus-compounds; Control-technology; Safety-practices;
CAS No.
7440-74-6; 7440-55-3; 7440-38-2; 7723-14-0; 7784-34-1; 7719-12-2;
Publication Date
19890101
Fiscal Year
1989
NTIS Accession No.
NTIS Price
Priority Area
Control Technology and Personal Protective Equipment; Research Tools and Approaches; Control-technology;
Source Name
Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan
State
PA; MI;
TOP