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Development of Rapid Test Systems to Identify Prenatal Toxic Chemicals and Chemical Mixtures Used in Semiconductor Production.

Authors
Irvin-TR
Source
Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan 1989:75-84
Link
NIOSHTIC No.
00189057
Abstract
A method was developed for the rapid identification of prenatal toxic effects of chemicals and chemical mixtures used in the semiconductor industry. Post implantation rodent embryo cultures were established, and used in the identification of prenatal toxic agents associated with microchip production. Nulliparous, female Sprague-Dawley-rats were used in the study. For each chemical to be tested, a 15 milliliter cell culture media mixture was prepared. Embryos were removed on day 11 of gestation. The in-vitro embryotoxicity of many chemical agents used in the production of semiconductor products or generated as byproducts of microchip manufacturing activities were initially characterized. As an example, aliquots of trichloroethylene (79016) (TCE) were added directly to embryonic cultures and, after 24 hours, each embryo was graded for ultrastructural abnormalities. TCE exhibited dose dependent inhibition of embryonic growth with 9 to 27 percent decrease in embryonic crown/rump length when cultured in 0.125 to trichloroacetophenone (56778655), dose dependent embryotoxicity was again observed; there was a 17 percent decrease in embryonic growth observed at a culture concentration of 50 parts per trillion (ppt), increasing to 28 percent at 100ppt. The role of chemical bioconversion in the embryotoxicity of 2-methoxyethanol (109864) (2- ME) was also demonstrated.
Keywords
Semiconductors; Electronics-industry; Screening-methods; Chlorinated-hydrocarbons; Cell-cultures; Reproductive-hazards; Embryotoxicity; Organic-solvents; Solvent-vapors; Laboratory-animals;
CAS No.
79-01-6; 56778-65-5; 109-86-4;
Publication Date
19890101
Fiscal Year
1989
NTIS Accession No.
NTIS Price
Source Name
Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan
State
MI;
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