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Health hazard evaluation report: HETA-81-319-1114, Inmos Corporation, Colorado Springs, Colorado.

Authors
Gunter-BJ
Source
Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control and Prevention, National Institute for Occupational Safety and Health, HETA 81-319-1114, 1982 May; :1-22
NIOSHTIC No.
00127497
Abstract
The chemical and physical hazards present at a semiconductor facility, in Inmos Corporation (SIC-3674), Colorado Springs, Colorado, were investigated. The survey was performed in July, September, and October of 1981 at the request of the facility's management. Breathing zone and general room air samples were collected, radio frequency measurements performed, and noise levels assessed. All values for air samples of butyl-acetate (123864), cellosolve-acetate (111159), xylene (1330207), isopropanol (67630), hydrogen-fluoride (7664393), hydrochloric-acid (7647010), hydrogen- peroxide (7722841), arsenic (7440382), sulfuric-acid (7664939), crystalline silica (14808607), nitric-acid (7697372), phosphoric- acid (7664382), and total particulates were either below detection limits or well below evaluation criteria values. Radiofrequency measurements indicated that none of the workers was receiving any exposure. Noise exposures averaged less than 80 decibels. The evaluation criteria is 85 decibels. The author concludes that a health hazard due to chemical, radiofrequency, or noise exposure did not exist at the time of the survey.
Keywords
NIOSH-Author; NIOSH-Health-Hazard-Evaluation; Hazards-Unconfirmed; Air-quality-measurement; Industrial-exposures; Industrial-hazards; Electrical-industry; Radiation-measurement; Semiconductors; HETA-81-319-1114; NIOSH-Technical-Assistance-Report; Region-8; Author Keywords: Electronic Components and Accessories/Semiconductors and Related Devices; arsenic; cellosolve acetate; crystalline silica (quartz, cristobalite, total particulate); hydrochloric acid; hydrogen fluoride; hydrogen peroxide; isopropanol; nitric acid; phosphoric acid; sulfuric acid; xylene; semiconductor plants; radiofrequency; noise
CAS No.
123-86-4; 111-15-9; 1330-20-7; 67-63-0; 7664-39-3; 7647-01-0; 7722-84-1; 7440-38-2; 7664-93-9; 14808-60-7; 7697-37-2; 7664-38-2
Publication Date
19820501
Document Type
Field Studies; Hazard Evaluation and Technical Assistance
Fiscal Year
1982
NTIS Accession No.
PB84-140664
NTIS Price
A03
Identifying No.
HETA-81-319-1114
NIOSH Division
DSHEFS
SIC Code
3674
Source Name
National Institute for Occupational Safety and Health
State
CO; OH
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