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Industrial Hygiene Walk-Through Survey Report of Dow Corning Corporation Semiconductor Plant, Hemlock, Michigan.

Authors
Willson-RD
Source
NIOSH 1978 Oct:19 pages
Link
NIOSHTIC No.
00108660
Abstract
Worker exposures to potentially hazardous physical and chemical agents were determined at the Dow Corning Corporation's semiconductor facility (SIC-3674) in Hemlock, Michigan, on September 6, 1978. The survey was part of a NIOSH health study of newly developing energy technologies. The company had access to an industrial hygiene staff. Signs of leakage of trichlorosilane (10025782) (TCS) were noted at the truck unloading area. Heavy accumulation of a white powder on the ceilings indicated the presence of airborne process materials. The author concludes that the operations at the facility may not be extensive enough to be representative of the photovoltaic cell industry. He recommends an industrial hygiene survey for the TCS unloading area, main production vessel rooms, the cleaning room, and for material recovery processes.
Keywords
NIOSH-Author; NIOSH-Survey; Field-Study; Region-5; Health-surveys; Worker-health; Industrial-hygiene; Workplace-studies; Occupational-health-programs; Industrial-processes; Air-contamination; IWS-68-22;
CAS No.
10025-78-2;
Publication Date
19781012
Fiscal Year
1979
NTIS Accession No.
PB82-108275
NTIS Price
A03
Identifying No.
IWS-68-22
NIOSH Division
DSHEFS;
SIC Code
3674;
Source Name
NIOSH, Division of Surveillance, Hazard Evaluations and Field Studies, Industry Wide Studies Branch, Cincinnati, Ohio, 19 pages
State
MI; OH;
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